Plasma Sources for Thin Film Deposition and Etching, Volume 18

by ,

Write The First Customer Review
Show Synopsis

This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.

Filter Results
Shipping
Item Condition
Seller Rating
Other Options
Change Currency

Customer Reviews

Write a Review


This item doesn't have extra editions

loading