Advances in Research and Development, Volume 23: Modeling of Film Deposition for Microelectronic Applications

by ,

Write The First Customer Review
Show Synopsis

Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared emissions.

Filter Results
Shipping
Item Condition
Seller Rating
Other Options
Change Currency

Customer Reviews

Write a Review


This item doesn't have extra editions

loading